Title:
METHOD OF REMOVING HYDROGEN FLUORIDE CONTAINED IN HYDROGEN CHLORIDE
Document Type and Number:
Japanese Patent JPS6136102
Kind Code:
A
Abstract:
PURPOSE: To reduce HF in HCl to ≤ an allowable value as an impurity by a simple operation, bringing a HF-containing HCl gas into contact with an ionic hydroxyl group-containing compound solution suspending alkali aluminate powder.
CONSTITUTION: A HCl gas containing about 20W30ppm HF, produced as a by-product during production of trichlorotrifuluoroethane, etc. is introduced to and brought into contact with a reagent for removal of HF, comprising a suspension obtained by suspending 0.03W1.4wt% alkali aluminate (e.g., NaAlO2) powder in 9W98wt% nonionic hydroxyl group-containing compound solution consisting of 1W5C mono- W polyhydric alcohol (e.g., ethanol, or glycerin), so that HF in HCl is reduced to 2W3ppm.
Inventors:
NOSHIRO MAKOTO
YARITA TOMIO
OTSUKA ISAO
NAKANO TAKEO
HASHIMOTO TOSHIO
ENOMOTO AKIRA
YARITA TOMIO
OTSUKA ISAO
NAKANO TAKEO
HASHIMOTO TOSHIO
ENOMOTO AKIRA
Application Number:
JP15546284A
Publication Date:
February 20, 1986
Filing Date:
July 27, 1984
Export Citation:
Assignee:
ASAHI GLASS CO LTD
International Classes:
B01D53/14; B01D53/34; B01D53/68; B01D53/77; C01B7/00; C01B7/07; (IPC1-7): B01D53/14; B01D53/34; C01B7/00
Domestic Patent References:
| JPS5638643U | 1981-04-11 | |||
| JPS5324228U | 1978-03-01 |
Attorney, Agent or Firm:
Akira Uchida