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Patent Searching and Data


Title:
METHOD FOR REMOVING RESIDUE OF FLUORIDE-BASED FLUX
Document Type and Number:
Japanese Patent JPH03165967
Kind Code:
A
Abstract:

PURPOSE: To simply remove residue of a fluoride-based flux/by successively subjecting an Al product brazed with the flux to the hydration with boiling water, etc. after providing boehmite treatment.

CONSTITUTION: Al constituent members are joined by brazing with a potassium fluoroaluminate-based flux. Since light-gray residue of the flux remains on the resulting as an ununiform film, the product is immersed in a boehmite treating soln. prepd. by adding 3% triethanol-amine to pure water at a prescribed temp. for a prescribed time and the treated product is held in a pressure vessel under a prescribed vapor pressure for a prescribed time. The residue sticking to the surface of the product becomes fine powder by decomposition and this powder is perfectly removed by washing. After anodic oxidaton treatment, the sealing treatment by hydration may be carried out in place of the boehmite treatment. The adhesion of a coating film as well as the appearance of the product is improved and the corrosion resistance of the product can also be improved because a boehmite or anodized aluminum film is formed.


Inventors:
USUI TADASHI
NOGAMI TOYOICHIRO
KUZUU SHIGERU
Application Number:
JP30447489A
Publication Date:
July 17, 1991
Filing Date:
November 21, 1989
Export Citation:
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Assignee:
SHOWA ALUMINUM CORP
International Classes:
B23K1/00; (IPC1-7): B23K1/00
Attorney, Agent or Firm:
Hisayoshi Shimizu