Title:
METHOD FOR REMOVING RESIST
Document Type and Number:
Japanese Patent JP2001324822
Kind Code:
A
Abstract:
To provide a method for removing a resist by which a resist with a degenerated layer on a substrate can be removed from the substrate in a short time.
A resist 24 with a degenerated layer 25 disposed on a substrate 26 is removed from the substrate 26 in the sheet shape by allowing an organic solvent 22 to penetrate into the boundary face 32 of the resist 24.
Inventors:
SUZUKI TAKAYUKI
Application Number:
JP2000141712A
Publication Date:
November 22, 2001
Filing Date:
May 15, 2000
Export Citation:
Assignee:
SEIKO EPSON CORP
International Classes:
G03F7/42; H01L21/027; (IPC1-7): G03F7/42; H01L21/027
Attorney, Agent or Firm:
Masanori Ueyanagi (1 outside)
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