Title:
METHOD FOR REPETITIVE SELF-ALIGNED INTERCONNECTION
Document Type and Number:
Japanese Patent JPH04233253
Kind Code:
A
Abstract:
PURPOSE: To provide a method for forming a multilayer for mutual connect, neighboring to a flat surface. CONSTITUTION: A first insulator layer is formed, adjacent to a flat surface. A first conductor layer is formed neighboring to the first insulator layer. A second insulator layer is formed, adjacent to the first conductor layer. A first cavity and a second cavity are formed, and each of them has a sidewall which penetrates the second insulator layer and the first conductor layer and stretches. The first cavity is formed wider than the second cavity. Adjacent to the second insulator layer, a third insulator layer is deposited conformably. Sidewall insulator is stuck on the sidewall of the first cavity. The second cavity is in effect filled with an insulator. Etching is performed so that a part of the above flat surface is exposed passing the first cavity. A second conductor layer is deposited conformably adjacent to the third insulator layer. The second conductor layer stretches passing the first cavity and is formed in contact with the flat surface.
Inventors:
DONARUDO JIEI KOORUMAN JIYUNIA
Application Number:
JP15871591A
Publication Date:
August 21, 1992
Filing Date:
June 28, 1991
Export Citation:
Assignee:
TEXAS INSTRUMENTS INC
International Classes:
H01L21/28; H01L21/3205; H01L21/336; H01L21/768; H01L29/78; (IPC1-7): H01L21/28; H01L21/3205; H01L21/336; H01L21/90; H01L29/784
Attorney, Agent or Firm:
Akira Asamura (3 outside)
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