To provide a method for setting and maintaining the concentration of deposition metal ions present in an electrolyte for depositing metal on a substrate without being influenced by the corresponding cation concentration, and to provide a device therefor.
Since an electrolytic flow 1 and an exchange liquid flow 2 contact each other via a cation exchange membrane or a microporous membrane 3, deposition metal ions (Ni2+) present in the exchange liquid flow move to the electrolytic flow 2 via the cation exchange membrane or microporous membrane 3 by Donnan dialysis. In this way, the concentration of the deposition metal ions in the electrolytic flow 1 can be set without changing the cation concentration or cation constitution in the electrolyte.
MOEBIUS ANDREAS
STARK FRANZ-JOSEF
