Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
METHOD FOR SHAPING IRRADIANCE PROFILE USING OPTICAL ELEMENT HAVING POSITIVE AND NEGATIVE OPTICAL POWER
Document Type and Number:
Japanese Patent JP2006065348
Kind Code:
A
Abstract:

To provide efficient energy deposition on targets having optional shapes.

A system for shaping an irradiance profile of plural apertures uses at least one arrangement, consisting of at least three apertures which correspond to plural optical elements, at least one of the optical elements has positive optical power and at least one of the optical elements has negative optical power. The system has an aperture in one dimension, two dimensions or three dimensions. The system generates the prescribed irradiance profile on a target. The shape of the aperture is preferably one of a square, a rectangle and a hexagon. The system is preferably constituted of apertures having symmetrical or asymmetrical shapes, capable of attaining an almost 100% fill factor.


Inventors:
BROWN DANIEL M
Application Number:
JP2005304778A
Publication Date:
March 09, 2006
Filing Date:
October 19, 2005
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
MEMS OPTICAL INC
International Classes:
G02B27/09; B23K26/06; B23K26/067; G02B3/00; G02B19/00
Attorney, Agent or Firm:
Aoyama Aoi
Yasumichi Furukawa
Atsushi Maeda