Title:
METHOD AND SYSTEM FOR AUTOMATIC WASHING
Document Type and Number:
Japanese Patent JP3631775
Kind Code:
B2
Abstract:
PURPOSE: To remove resist contaminant quickly and completely using a chemical substance requiring no special waste processing by irradiating an object in a chamber with UV-rays, applying a developer fluid and a surfactant solution to the object, washing the object with water and then drying the object by blowing the air into the chamber.
CONSTITUTION: A contaminated cassette 16 and a carrier 18 are set in a process chamber 10 and irradiated with UV-rays for the purpose of perfect exposure of an arbitrary resist flake. Concentrated developer is then sprayed through a spray nozzle 24 or atomized in order to impregnate the cassette 16 and the carrier 18 with the developer thus dissolving the contaminants. After finishing simple ultrapure water washing, a surfactant mixing valve 60 is opened, and a solution of surfactant/ultrapure water is sprayed into the chamber 10 in order to wash away granular matters. Finally, high-temperature ultrapure water is sprayed and heated, filtered and ionized ultralow particle air is blown into the process chamber 10 in order to dry the part under processing.
Inventors:
Daniel B. Doran
Application Number:
JP3618394A
Publication Date:
March 23, 2005
Filing Date:
March 07, 1994
Export Citation:
Assignee:
HYUNDAI ELECTR0NICSAMERICA
NCR International,Inc.
Symbios Incorporated
NCR International,Inc.
Symbios Incorporated
International Classes:
B08B7/04; B08B7/00; H01L21/00; H01L21/304; H01L21/673; (IPC1-7): H01L21/304; B08B7/04; H01L21/68
Domestic Patent References:
| JP4290587A | ||||
| JP4006831A | ||||
| JP4214627A | ||||
| JP4333234A | ||||
| JP60189921A | ||||
| JP3012918A |
Attorney, Agent or Firm:
Yoshiaki Nishiyama