Title:
METHOD AND SYSTEM FOR REPLENISHING GAS FOR EXCIMER LASER
Document Type and Number:
Japanese Patent JP3447281
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide an improved method and system for replenishing a gas mixture in a fluorine/krypton excimer laser having the gas mixture comprising fluorine, krypton, and neon.
SOLUTION: This excimer laser has a gas source (32) of individual fluorine/ neon used for replenishing the gas mixture, and a gas source (34) of the krypton/ neon. To remove one portion of the gas mixture from the excimer laser, a take-out mechanism (36) is provided. To selectively change the gas mixture for generally maintaining optimum laser efficiency, a control mechanism (44) controls the gas source (32) of the fluorine/neon, the gas source (34) of the krypton/neon, and the take-out mechanism (36). The control system (44) preferably monitors the operation parameters of the excimer laser including gain, wavelength, bandwidth, and the number of pulse repetition to measure whether the gas mixture is different from an optimum mixture or not.
Inventors:
Sandstorm, Richard Elle
Application Number:
JP2001377049A
Publication Date:
September 16, 2003
Filing Date:
August 31, 1994
Export Citation:
Assignee:
Cymer Incorporated
International Classes:
H01S3/225; (IPC1-7): H01S3/225
Domestic Patent References:
| JP62242378A | ||||
| JP6164026A | ||||
| JP4334079A | ||||
| JP2143480A | ||||
| JP6177461A | ||||
| JP7321389A | ||||
| JP158968U |
Other References:
【文献】米国特許4977573(US,A)
Attorney, Agent or Firm:
Masaki Yamakawa (4 outside)