Title:
METHOD AND SYSTEM FOR WET PROCESSING
Document Type and Number:
Japanese Patent JP3296428
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide method and system for WET processing to which a quick drainage rinse method exhibiting high rinse effect in a short time is applied.
SOLUTION: The WET processing system comprises a water supply nozzle 10 for supplying film-like cleaning water to the wall surface of a bath facing the wafer surface at the time of quick drainage, a pure water recovery block 12 for recovering the cleaning water supplied to the tank wall in synchronism with the liquid level at the time of quick drainage, a water supply valve 17 for supplying pure water to overflow upon finishing quick drainage, and an outermost bath 1 containing a rinse bath 2 and receiving and discharging pure water flowing over the rinse bath 2. Particles adhering to the bath wall 13 and removed therefrom by a wave generated at the time of quick drainage are prevented from adhering to the wafer.
Inventors:
Hidehiko Kawaguchi
Application Number:
JP18206099A
Publication Date:
July 02, 2002
Filing Date:
June 28, 1999
Export Citation:
Assignee:
NEC
International Classes:
B08B3/04; F26B5/00; H01L21/304; (IPC1-7): H01L21/304; B08B3/04
Domestic Patent References:
| JP1050654A | ||||
| JP2000334401A | ||||
| JP5783036A | ||||
| JP61179742U |
Attorney, Agent or Firm:
Nobuyuki Kaneda (2 others)
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