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Title:
METHOD FOR TREATING WASTE LIQUID, APPARATUS THEREFOR AND CLEANING APPARATUS USING IT
Document Type and Number:
Japanese Patent JP2001347258
Kind Code:
A
Abstract:

To provide a method for treating waste liquid, and an apparatus therefor which decomposes and removes chlorine containing organic compounds included in the waste liquid from dry cleaning or the like, are excellent in treating efficiency, and can restrict the discharge of secondary byproducts such as chlorine containing gases.

Waste liquid containing chlorine based organic compounds is treated by vaporization and the resulting vaporized gas containing the chlorine based organic compounds is fed to a photocatalyst reaction part where photocatalytic granules are filled in a has flow pipe, and the vaporized gas is decomposed by photooxidation by radiating light from an ultraviolet ray source to the photocatalyst reaction part, and the decomposition production gas generated by photo-oxidative decomposition is absorbed, adsorbed and neutralized with a treating agent.


Inventors:
YAMAMOTO JUN
OSAWA AKIRA
MUROI KUNIMASA
NAGASAKI YOICHI
Application Number:
JP2000305316A
Publication Date:
December 18, 2001
Filing Date:
October 04, 2000
Export Citation:
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Assignee:
YAMAHA CORP
International Classes:
A62D3/00; B01D3/34; B01D19/00; B01D53/68; B01D53/77; B01D53/86; B01J35/02; C02F1/20; C02F1/32; C02F1/72; (IPC1-7): C02F1/20; A62D3/00; B01D19/00; B01D53/68; B01D53/77; B01D53/86; B01J35/02
Attorney, Agent or Firm:
Masatake Shiga (1 person outside)