Title:
シリコン膜形成のための方法と組成物
Document Type and Number:
Japanese Patent JP5013128
Kind Code:
B2
Abstract:
There are provided a silane polymer having a higher molecular weight from the viewpoints of wettability when applied to a substrate, a boiling point and safety, a composition which can form a high-quality silicon film easily, a silicon film forming composition which comprises a silane polymer obtained by irradiating a photopolymerizable silane compound with light of specific wavelength range to photopolymerize it, and a method for forming a silicon film which comprises applying the composition to a substrate and subjecting the coating film to a heat treatment and/or a light treatment.
Inventors:
Haruo Iwasawa
Royal road
Yoji Matsuki
Hitoshi Kato
Royal road
Yoji Matsuki
Hitoshi Kato
Application Number:
JP2008303482A
Publication Date:
August 29, 2012
Filing Date:
November 28, 2008
Export Citation:
Assignee:
JSR CORPORATION
International Classes:
C01B33/04; C01B33/02; C01B33/08; C09D4/00; C09D183/16; C23C18/08; C23C18/14; H01L21/208
Domestic Patent References:
| JP5032785A | ||||
| JP7300529A | ||||
| JP2003313299A | ||||
| JP2003318119A | ||||
| JP2003124486A | ||||
| JP2001262058A | ||||
| JP2001220445A |
Attorney, Agent or Firm:
Masataka Oshima
Hideo Katsumata
Taizo Shiraishi
Hideo Katsumata
Taizo Shiraishi