Title:
吸収剤組織に粒子を適用するための方法および装置
Document Type and Number:
Japanese Patent JP4777438
Kind Code:
B2
Abstract:
An apparatus and a method for applying particles within a pre-determined limited area of an absorbent structure. The apparatus has: a nozzle arranged to dispense the particles on the pre-determined limited area of the absorbent structure; conduit for supplying particles by a gas flow from a particle container to the nozzle; a valve arranged between the nozzle and the particle container; and, a valve vane arranged to direct the gas flow having particles through the valve from a particle inlet to an application outlet when the valve is in a first position and to direct the gas flow having particles through the valve from the particle inlet to a residue outlet when the valve is in a second position. The apparatus also has a device for maintaining a gas flow in the application outlet when the valve is in the second position.
Inventors:
Goen Force Bring
Application Number:
JP2008545527A
Publication Date:
September 21, 2011
Filing Date:
December 15, 2005
Export Citation:
Assignee:
Ssear Hygene Products Arb
International Classes:
A61F13/15; A61F13/472; A61F13/49; B05B14/10; B05C5/02; B05D7/00; B05D7/24
Domestic Patent References:
| JP2004000830A | 2004-01-08 |
Foreign References:
| US5279854A | 1994-01-18 | |||
| US5028224A | 1991-07-02 | |||
| US5102585A | 1992-04-07 |
Attorney, Agent or Firm:
Masatake Shiga
Takashi Watanabe
Yasuhiko Murayama
Shinya Mitsuhiro
Takashi Watanabe
Yasuhiko Murayama
Shinya Mitsuhiro