Title:
メトロロジセンサ、リソグラフィ装置、及びデバイスを製造するための方法
Document Type and Number:
Japanese Patent JP6917472
Kind Code:
B2
Abstract:
Disclosed is a metrology sensor apparatus comprising: an illumination system operable to illuminate a metrology mark in on a substrate with illumination radiation; an optical collection system configured to collect scattered radiation, following scattering of the illumination radiation by the metrology mark; and a wavelength dependent spatial filter for spatially filtering the scattered radiation, the wavelength dependent spatial filter having a spatial profile dependent on the wavelength of the scattered radiation. The wavelength dependent spatial filter may comprise a dichroic filter operable to substantially transmit scattered radiation within a first wavelength range and substantially block scattered radiation within a second wavelength range and at least one second filter operable to substantially block scattered radiation at least within the first wavelength range and the second wavelength range.
Inventors:
Gouaden, Sebastian, Adrianas
Ackermans, Johannes, Antonius, Geralds
Whisman, Simon, Reynaldo
Elazaree, Thamer, Mohamed, Taufik, Ahmed, Mohamed
Ackermans, Johannes, Antonius, Geralds
Whisman, Simon, Reynaldo
Elazaree, Thamer, Mohamed, Taufik, Ahmed, Mohamed
Application Number:
JP2019557457A
Publication Date:
August 11, 2021
Filing Date:
April 13, 2018
Export Citation:
Assignee:
AS M Netherlands B.V.
AS ML Holding N.V.
AS ML Holding N.V.
International Classes:
G03F7/20; H01L21/66
Domestic Patent References:
| JP2012242746A | ||||
| JP2012060131A | ||||
| JP2015532465A |
Foreign References:
| WO2017036833A1 | ||||
| WO2016104511A1 | ||||
| US20090002706 | ||||
| CN101526750A |
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito
Toshifumi Onuki
Akihiko Eguchi
Kazuhiko Naito