Title:
ホスフェート、シクロヘキサノン及びシクロヘキサノンオキシムを含む水性媒体を処理する方法
Document Type and Number:
Japanese Patent JP4171698
Kind Code:
B2
Abstract:
The invention relates to a process for treating an aqueous medium containing phosphate, cyclohexanone and/or cyclohexanone oxime, said process comprising: feeding the aqueous medium to a stripping zone; passing steam through the aqueous medium in the stripping zone; and discharging a vapor stream from said stripping zone; wherein the joint content cyclohexanone and cyclohexanone oxime in the aqueous medium entering the stripping zone is less than 0.08 wt.%.
Inventors:
Bennekel, Arno
Oevering, Genk
Blowwells, Johannes, Antonius, Leonardus
Oevering, Genk
Blowwells, Johannes, Antonius, Leonardus
Application Number:
JP2003500041A
Publication Date:
October 22, 2008
Filing Date:
May 29, 2002
Export Citation:
Assignee:
DSM IP ASSETS B.V.
International Classes:
B01D11/04; C07C249/08; B01D3/00; C07B61/00; C07C249/14; C07C251/44
Domestic Patent References:
| JP46001771A | ||||
| JP48035257B1 | ||||
| JP45018647B1 | ||||
| JP2003535842A |
Foreign References:
| DE4328795A1 |
Attorney, Agent or Firm:
Yuichi Yamada
Masakazu Noda
Yoshinori Shimizu
Masakazu Noda
Yoshinori Shimizu
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