Title:
空中画像を使用するレチクル検査のための方法及び装置
Document Type and Number:
Japanese Patent JP4841721
Kind Code:
B2
Abstract:
A reticle inspection system for inspecting reticles can be used as an incoming inspection tool, and as a periodic and pre-exposure inspection tool. Mask shops can use it as an inspection tool compatible to their customers, and as a printable error detection tool. The inventive system detects two kinds of defects: (1) line width errors in the printed image; (2) surface defects. The line width errors are detected on the die area. The detection is performed by acquiring the image of the reticle under the same optical conditions as the exposure conditions, (i.e. wavelength, numerical aperture, sigma, and illumination aperture type) and by comparing multiple dies to find errors in the line width. Surface defects are detected all over the reticle. The detection of surface defects is performed by acquiring transmission and dark-field reflection images of the reticle and using the combined information to detect particles, and other surface defects.
Inventors:
Boaz Kenan
Yeah Elan
Avner Carpol
Emmanuel Elia Suff
Ehad Telosh
Yeah Elan
Avner Carpol
Emmanuel Elia Suff
Ehad Telosh
Application Number:
JP2000351938A
Publication Date:
December 21, 2011
Filing Date:
October 13, 2000
Export Citation:
Assignee:
APPLIED MATERIALS,INCORPORATED
International Classes:
G01N21/956; G01B11/24; G03F7/20; H01L21/027; G03F1/00
Domestic Patent References:
| JP55500510A | ||||
| JP61501062A | ||||
| JP62035618A | ||||
| JP5296937A | ||||
| JP7028226A |
Attorney, Agent or Firm:
Minoru Nakamura
Fumiaki Otsuka
Sadao Kumakura
Takaki Nishijima
Atsushi Hakoda
Makoto Hirano
Fumiaki Otsuka
Sadao Kumakura
Takaki Nishijima
Atsushi Hakoda
Makoto Hirano