Title:
低多分散性の光画像形成可能なポリマーおよびフォトレジストならびにマイクロリソグラフィーのための方法
Document Type and Number:
Japanese Patent JP2007506846
Kind Code:
A
Abstract:
The invention pertains to low polydispersity copolymers useful for photoimaging and photoresist compositions, and to the photoimaging processes which use these compositions. The low polydispersity copolymers of this invention are prepared using controlled radical polymerization (CRP) techniques, such as RAFT (reversible addition fragmentation chain transfer) polymerization.
Inventors:
Andrew Edward Failing
Michael fried
Frank El. Shut The Third
Michael fried
Frank El. Shut The Third
Application Number:
JP2006528166A
Publication Date:
March 22, 2007
Filing Date:
September 22, 2004
Export Citation:
Assignee:
E.I.DU PONT DE NEMOURS AND COMPANY
International Classes:
C08F220/10; C08F2/32; C08F2/38; C08F10/00; C08F220/22; C08F220/26; C08F232/00; C09D133/14; G03C1/492; G03F7/004; G03F7/038; G03F7/039; H01L21/027
Attorney, Agent or Firm:
Yoshikazu Tani
Kazuo Abe
Kazuo Abe