Title:
レジスト組成物及びレジストパターンの製造方法並びに化合物
Document Type and Number:
Japanese Patent JP6721337
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide a resin and a resist composition which make it possible to produce a resist pattern with excellent line edge roughness.SOLUTION: The present invention provides a resin having a structural unit derived from a compound represented by formula (I) [where, Ris a hydrogen atom or a methyl group. Ris a hydrogen atom, a hydroxy group or a C1-C12 hydrocarbon group, -CH- included in the hydrocarbon group is optionally substituted by -O-or -CO-. m is an integer of 1-6 . When m is 2 or more, two or more Rmay be the same or different, two or more Rmay together form a ring. X is an oxygen atom or a sulfur atom. Ais a single bond and the like.SELECTED DRAWING: None
Inventors:
Tatsuro Masuyama
Takayuki Miyagawa
Koji Ichikawa
Takayuki Miyagawa
Koji Ichikawa
Application Number:
JP2016001963A
Publication Date:
July 15, 2020
Filing Date:
January 07, 2016
Export Citation:
Assignee:
Sumitomo Chemical Co., Ltd.
International Classes:
C08F20/36; C08F20/38; C08L35/02; G03F7/004; G03F7/039; G03F7/20
Domestic Patent References:
| JP2014071216A | ||||
| JP2002023371A | ||||
| JP2012189977A | ||||
| JP2011039502A | ||||
| JP2009244859A |
Foreign References:
| WO2003031414A1 |
Other References:
Mero, Christopher L. et al.,Journal of Organic Chemistry,2000年,65(3),775-781,DOI: 10.1021/jo9914420
Attorney, Agent or Firm:
Shinki Global IP Patent Corporation