Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
MICRO-ANALYSIS CHIP, ITS MANUFACTURING METHOD AND ANALYZER USING THE SAME
Document Type and Number:
Japanese Patent JP2004286449
Kind Code:
A
Abstract:

To provide a micro-analysis chip having extra fine grooves formed by using a film-shaped photoresist, its manufacturing method and an analyzer such as a device for capillary electrophoretic migration using the same.

In this method of forming the ultra fine grooves by using the film-shaped photoresist, a micro analysis chip and its manufacturing method is characterized by including the same kind of molecular structure part in at least one set of an insulating base and the photoresist, or the photoresist and a seal member, when the seal member is adhered to the ultra fine grooves manufactured by closely adhering the film-shaped photoresist onto the insulating base, and then exposing and developing the film-shaped photoresist.


Inventors:
Yamanoi, Kiyoshi
Obara, Kazuhiko
Nakano, Akio
Watanabe, Hiroo
Application Number:
JP2003000075433
Publication Date:
October 14, 2004
Filing Date:
March 19, 2003
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
HITACHI CHEM CO LTD
International Classes:
G01N27/447; G01N37/00; G01N27/447; G01N37/00; (IPC1-7): G01N27/447; G01N37/00