Title:
MICRO DEVICE AND METHOD OF MANUFACTURING THE SAME
Document Type and Number:
Japanese Patent JP2015173206
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a micro device equipped with a protection film having sufficient moisture permeation resistance.SOLUTION: A micro device includes: a substrate; a bottom electrode formed on the substrate; a ferroelectric layer formed in a partial region on a bottom electrode layer; an upper electrode layer formed while covering the ferroelectric layer; and an alumina thin film which covers the bottom electrode layer, the ferroelectric layer and the upper electrode layer and has a composition formula AlO(0
Inventors:
KONISHI JUNICHI
Application Number:
JP2014048856A
Publication Date:
October 01, 2015
Filing Date:
March 12, 2014
Export Citation:
Assignee:
RICOH CO LTD
International Classes:
H01L41/23; C23C14/08; C23C16/40; H01L41/053; H01L41/09; H01L41/113
Domestic Patent References:
| JP2013026246A | 2013-02-04 | |||
| JP2013149646A | 2013-08-01 | |||
| JP2013149669A | 2013-08-01 |
Foreign References:
| WO2008149402A1 | 2008-12-11 | |||
| US20130015392A1 | 2013-01-17 | |||
| US20100068829A1 | 2010-03-18 |
Attorney, Agent or Firm:
Mitsuo Tanaka
Samejima Mutsumi
Samejima Mutsumi