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Patent Searching and Data


Title:
MICROELEMENT
Document Type and Number:
Japanese Patent JP2011027973
Kind Code:
A
Abstract:

To reduce the influence of the variations in the stress due to the difference in thermal expansion rates, generated by the variation in environmental temperature and the variation in stress due to the deterioration of strength of an adhesive portion which fixes a micromirror element given to the tilt angle of the micromirror.

The microelement includes fixed frames 1; a movable frame 13 which rocks with respect to the fixed frames 1; torsion bars 11a and 11b which regulates the rocking axis of the movable frame 13; a stress relaxation mechanism 50, provided at least one of the fixed frames 1 and the torsion bars 11a, 11b, wherein the rigidity of the stress relaxation mechanism 50 in the axial direction of torsion bars 11a and 11b is smaller than the rigidity in the axial direction of the torsion bars 11a and 11b; and the rigidity of the stress relaxation mechanism 50 in the rotational direction around the center of the torsion bars 11a and 11b is larger than the rigidity in the rotational direction of around the center of the torsion bars 11a and 11b.


Inventors:
MATSUMOTO TAKESHI
KOMA NORINAO
TSUBOI OSAMU
Application Number:
JP2009173117A
Publication Date:
February 10, 2011
Filing Date:
July 24, 2009
Export Citation:
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Assignee:
FUJITSU LTD
International Classes:
G02B26/08; B81B3/00
Domestic Patent References:
JPH0793783A1995-04-07
JPS57183515U1982-11-20
JP2003527621A2003-09-16
JP2003503754A2003-01-28
JP2010515095A2010-05-06
Foreign References:
US20040212864A12004-10-28
WO2008078182A22008-07-03
Attorney, Agent or Firm:
Ikeuchi, Sato & Partners