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Title:
MICROLITHOGRAPHIC PROJECTION OBJECTIVE SYSTEM
Document Type and Number:
Japanese Patent JP2014140060
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a microlithographic optical system capable of easily and continuously enhancing the image formation quality.SOLUTION: An assembly 11 includes several units of optical elements and an opening 14. The optical elements of the assembly 11 include a plane-convex lens 12 having a convex facing to an object and a flat surface facing to an image. As a terminal optical element for the assembly 11, an optical terminal element 17 having a flat surface plate is disposed. Between the flat surface of the lens 12 and the flat plate of the optical terminal element 17, and on the flat surface plate of the terminal element 17 facing to the image, respective immersion liquids 13b and 13a are disposed. As a result, such a structure guarantees no degradation of the plane-convex lens 12 by the contamination in the immersion liquid 13a disposed on the side facing to the image, and if the image-formation characteristic of the terminal element 17 or the flat surface plate of the terminal element 17 becomes insufficient because of the contamination or other damages, they can be replaced.

Inventors:
HELMUT BEIERL
HEIKO FELDMANN
JOCHEN HETZLER
TOTZECK MICHAEL
Application Number:
JP2014045298A
Publication Date:
July 31, 2014
Filing Date:
March 07, 2014
Export Citation:
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Assignee:
ZEISS CARL SMT GMBH
International Classes:
H01L21/027; G02B13/00
Domestic Patent References:
JP2007027439A2007-02-01
JP2006222222A2006-08-24
JP2001044116A2001-02-16
JP2006319064A2006-11-24
Foreign References:
WO2006080212A12006-08-03
EP1843385A12007-10-10
US20060176461A12006-08-10
WO2005031823A12005-04-07
US20060164616A12006-07-27
Attorney, Agent or Firm:
Koichi Tsujii
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi