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Title:
MICROLITHOGRAPHIC SYSTEM, LIGHTING SYSTEM FOR THE SAME, AND EXPOSURE METHOD FOR SUBSTRATE
Document Type and Number:
Japanese Patent JP2011009780
Kind Code:
A
Abstract:

To provide a microlithographic system in which partial coherence and a field size are variable.

The microlithographic system includes: a lighting source; a lighting optical system including, in the order from an objective lens side, (a) a first diffractive optical member that receives lighting from the lighting source, (b) a zoom lens, (c) a second diffractive optical member, (d) a condenser lens, (e) a relay lens, and (f) a reticle; and a projection optical system for imaging the reticle on the substrate. Wherein the microlithographic system provides zoomable numerical aperture.


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Inventors:
OSKOTSKY MARK
RYZHIKOV LEV
COSTON SCOTT
TSACOYEANES JAMES
AUGUSTYN WALTER
Application Number:
JP2010209880A
Publication Date:
January 13, 2011
Filing Date:
September 17, 2010
Export Citation:
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Assignee:
ASML HOLDING NV
International Classes:
G02B19/00; H01L21/027; G02B5/18; G02B13/18; G02B13/22; G02B13/26; G02B15/167; G03F7/20
Domestic Patent References:
JPH07263312A1995-10-13
JP2002083759A2002-03-22
JP2001176766A2001-06-29
JPH097941A1997-01-10
JPH05234848A1993-09-10
JPH10270312A1998-10-09
JP2001217188A2001-08-10
JP2001135560A2001-05-18
JP2002158157A2002-05-31
JP2000173918A2000-06-23
JP2001358057A2001-12-26
JPH086175A1996-01-12
Attorney, Agent or Firm:
Yoshiyuki Inaba
Toshifumi Onuki



 
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