Title:
マイクロリソグラフィの照明システム
Document Type and Number:
Japanese Patent JP5026788
Kind Code:
B2
Abstract:
The present invention relates to an illumination system for microlithography, especially for wavelengths ≰193 nm, especially preferably for EUV lithography for illuminating a field in a field plane with at least one optical integrator which splits up a light bundle emitted by a light source into a plurality of light channels each having a light intensity, characterized in that a filter is provided in the light path from the light source to the field plane, with the filter comprising filter elements which are configured in such a way that the light intensity of at least one light channel is reduced in the light path after the filter element.
Inventors:
Wolfgang Zinger
Joachim Vitozorek
Joachim Heinz
Gabriele Weilauhi
Manfred Maul
Joachim Vitozorek
Joachim Heinz
Gabriele Weilauhi
Manfred Maul
Application Number:
JP2006521398A
Publication Date:
September 19, 2012
Filing Date:
April 13, 2004
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
H01L21/027; G02B17/06; G03F7/20; G21K1/06
Domestic Patent References:
| JP2003185798A | ||||
| JP8181065A | ||||
| JP2000269114A | ||||
| JP11317348A | ||||
| JP11312639A |
Foreign References:
| WO2002027400A2 | ||||
| US6198793 | ||||
| US6452661 | ||||
| US6438199 | ||||
| EP1239330A1 | ||||
| EP1202101A2 |
Attorney, Agent or Firm:
Sadao Kumakura
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Takashi Watanabe
Fumiaki Otsuka
Takaki Nishijima
Hiroyuki Suda
Hiroshi Uesugi
Takashi Watanabe