マイクロマシン装置及びマイクロマシン装置の製造方法

Japanese Patent JP5193639

B2

An example of the present invention is a micromechanical device including, a substrate in which a signal line is provided, a micromachine which is mounted on the substrate, is formed of a conductive material into a beam-like shape, is elastically deformed by a function of an electric field in such a manner that the beam-like part moves closer to or apart from the signal line, and changes the electric characteristics concomitantly with the deformation, a deformation restraint section constituted of a material having a higher viscosity coefficient than the conductive material, provided on the opposite side of the micromachine to the signal line, for restraining deformation of the micromachine in a direction in which the micromachine is separated from the signal line, and a sealing body provided on the principal surface of the substrate, for covering the micromachine with a hollow section located therebetween.

JP3722021	OPTICAL SWITCH
WO/2010/138077	A MICROFLUIDIC DEVICE
JP3036681	CAPACITANCE TYPE ACCELERATION SENSOR

Susumu Obata
Michinobu Inoue
Takeshi Miyagi

JP2008071571A

May 08, 2013

March 19, 2008

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Toshiba Corporation

B81B3/00; B81C1/00; H01G5/16; H01H49/00; H01H59/00

JP2006147995A
JP2003503816A

Kurata Masatoshi
Satoshi Kono
Makoto Nakamura
Yoshihiro Fukuhara
Takashi Mine
Toshio Shirane
Sadao Muramatsu
Nobuhisa Nogawa
Kocho Chojiro
Naoki Kono
Katsu Sunagawa
Katsumura Hiro
Ryo Hashimoto
Tetsuya Kazama
Shoji Kawai
Tatsushi Sato
Takashi Okada
Mihoko Horiuchi
Takenori Masanori
Takuzo Ichihara
Yamashita Gen

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