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Title:
MICROMACHINE AND MANUFACTURE OF MICROMACHINE, AND SPATIAL OPTICAL MODULATING DEVICE AND MANUFACTURE OF SPATIAL OPTICAL MODULATING DEVICE
Document Type and Number:
Japanese Patent JP2000121966
Kind Code:
A
Abstract:

To improve the productivity by easily forming a complicated shape with good reproducibility not through a complicated process by forming a 2nd structure on a 1st structure by pattern transfer.

On a driving part 140 as the 1st structure which is movable, a microprism as the 2nd structure is formed by pattern transfer. In this case the 1st structure which is movable is formed on a silicon substrate by a method such as a silicon process wherein a photolithography process, dry etching, wet etching, oxide film formation, crystal growth, a CMP flattening process, etc., are combined, laser machining, sol-gel formation, sintering, machine cutting, etc. The 2nd structure can be formed on the 1st structure by pattern transfer by applying resin over the 1st structure which is previously formed and applying a pattern for forming the 2nd structure.


Inventors:
UEJIMA SHUNJI
YONEKUBO MASATOSHI
TAKEDA TAKASHI
NISHIKAWA HISAO
Application Number:
JP29121898A
Publication Date:
April 28, 2000
Filing Date:
October 13, 1998
Export Citation:
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Assignee:
SEIKO EPSON CORP
International Classes:
G02B26/08; B62D57/00; B81B3/00; B81B7/04; B81C1/00; B81C3/00; B81C99/00; (IPC1-7): G02B26/08; B62D57/00
Attorney, Agent or Firm:
Kisaburo Suzuki (2 outside)



 
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