Title:
MICROMETER EYEPIECE APPARATUS
Document Type and Number:
Japanese Patent JPH0510724
Kind Code:
A
Abstract:
PURPOSE:To provide a micrometer eyepiece apparatus which can carry out highly precise measurement while correcting the magnification error of an objective lens easily and whose structure is able to be simplified. CONSTITUTION:A micrometer eyepiece apparatus is fitted in an ocular part of a microscope and a light transmissive plate 2 on which an index line M is drawn is set at the position of an intermediate image and a measurement object and the index line M are photographed in a visible field and the movement of the index line M is measured to measure the length. A correction value computing means 26 to compute the correction value to correct the magnification error of an objective lens based on the movement distance of the light transmissive plate 2 when the index line M is moved between the chart lines of standard charts, a correction value memory means 25 to memorize the respective correction values to correct the own magnification error of the objective lens, and a computing means 27 to compute the true length of a measurement object using the correction value.
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Inventors:
YUGAWA HIROSHI
FUJIMOTO HIROHISA
EDA YUKIO
FUJIMOTO HIROHISA
EDA YUKIO
Application Number:
JP16161491A
Publication Date:
January 19, 1993
Filing Date:
July 02, 1991
Export Citation:
Assignee:
OLYMPUS OPTICAL CO
International Classes:
G01B9/04; G01B11/02; (IPC1-7): G01B9/04; G01B11/02
Attorney, Agent or Firm:
Takehiko Suzue
Next Patent: JPH0510725