To provide microscope equipment capable of resolving a minute pattern exceeding the theoretical resolution of the microscope equipment, and to provide a resolution inspecting method using the microscope equipment.
The microscope equipment is provided with: a solid-state imaging element having a plurality of pixels; a magnification optical system which forms a magnified image of at least a part of an observation object on the pixels of the solid-state imaging element; and an image processing means which applies an edge emphasizing filter having differentiating effect to an image obtained by the solid-state imaging element and, thereby, obtains an edge emphasized image corresponding to the image, wherein the magnification optical system is provided with a variable magnification optical system for imaging a linear part included in an observation region on the surface of the observation object as an image having a width which exceeds the size of individual pixel constituting the solid-state imaging element and is equal to or less than the width of an area processed by the edge emphasizing filter.
JP2002031758A | 2002-01-31 | |||
JPH07248453A | 1995-09-26 | |||
JPH0915506A | 1997-01-17 | |||
JPH1068616A | 1998-03-10 | |||
JP2003046782A | 2003-02-14 | |||
JPH10243224A | 1998-09-11 | |||
JPH0816773A | 1996-01-19 |
Toshihide Mori
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