Title:
マイクロ波プラズマ源、マイクロ波プラズマ処理装置、およびプラズマ処理方法
Document Type and Number:
Japanese Patent JP6749258
Kind Code:
B2
Abstract:
A microwave plasma source that generates a microwave plasma in a processing space in which a target substrate is processed, includes: a microwave generation part for generating microwave; a waveguide through which the microwave generated by the microwave generation part propagates; an antenna part including a slot antenna having a predetermined pattern of slots formed therein and being configured to radiate the microwave propagating through the waveguide into the processing space and a microwave-transmitting plate being made of a dielectric material and being configured to transmit the microwave radiated from the slots therethrough and supply the microwave into the processing space; a temperature detector for detecting a temperature at a predetermined position in a microwave propagation path leading to the slot antenna; and an abnormality detection part for receiving the temperature detected by the temperature detector and detect an abnormality in the microwave propagation path based on the detected temperature.
Inventors:
Yasuaki Taniike
Application Number:
JP2017015089A
Publication Date:
September 02, 2020
Filing Date:
January 31, 2017
Export Citation:
Assignee:
東京エレクトロン株式会社
International Classes:
H05H1/46; C23C16/511; C23C16/52; H01L21/3065; H01L21/31
Domestic Patent References:
| JP2008251660A | ||||
| JP2010003462A | ||||
| JP2008091218A | ||||
| JP2003338400A |
Attorney, Agent or Firm:
Hiroshi Takayama