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Title:
MICROWAVE PLASMA TREATMENT APPARATUS AND MICROWAVE SUPPLY METHOD
Document Type and Number:
Japanese Patent JP2015018683
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To maintain a uniform distribution of plasma excited by microwaves.SOLUTION: A microwave plasma treatment apparatus includes: a treatment container defining a treatment space; a microwave generator for generating microwaves for converting a treatment gas introduced into the treatment space to plasma; a distributor for distributing the microwaves to a plurality of waveguides; an antenna disposed on the treatment container so as to close the treatment space and adapted to radiate the microwaves distributed to the plurality of waveguides by the distributor to the treatment space; a monitor section for monitoring a voltage of each of the plurality of waveguides; and a control section for acquiring a control value of a distribution ratio of the distributor which corresponds to a difference between a monitored value of the voltage monitored by the monitor section and a predetermined reference value of the voltage, from a storage section associatively storing the difference and the control value of the distribution ratio of the distributor corresponding to the difference, and controlling the distribution ratio of the distributor on the basis of the acquired control value.

Inventors:
KANEKO KAZUFUMI
IWAO TOSHIHIKO
KAWAKAMI SATOSHI
Application Number:
JP2013145045A
Publication Date:
January 29, 2015
Filing Date:
July 10, 2013
Export Citation:
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Assignee:
TOKYO ELECTRON LTD
International Classes:
H05H1/46
Domestic Patent References:
JP2004266268A2004-09-24
JP2008066292A2008-03-21
Foreign References:
US20060021980A12006-02-02
US20100239782A12010-09-23
Attorney, Agent or Firm:
Hiroaki Sakai



 
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