To provide a microwave treatment device in which, when microwave is irradiated on an object to be heated, a portion where the microwave is irradiated strongly is controlled to attain a high heating efficiency and an improvement in finishing of the heated object.
The microwave treatment device is provided with oscillators 2a, 2b, power distributors 3a, 3b, phase variable portions 4a-4d, power amplifiers 5a-5d, a heating chamber 10 where a heated object is housed, power supplying portions 8a-8d which are arranged on a wall surface of the heating chamber 10 and to which an output of a microwave generating portion is transmitted and which discharge and supply the microwave to the heating chamber 10, and power detecting portions 6a-6d for detecting power reflected from the power supplying portions to the power amplifiers 5a-5d. A phase difference is generated in the microwave generated by the power supplying portions by the phase variable portions 4a-4d and an interference position of electric field of the microwave in the heating chamber is controlled, and, as a result, the microwave can be absorbed efficiently into the object to be heated.
NOBUE TOMOTAKA
OMORI YOSHIHARU
MIHARA MAKOTO
| JPS5299448A | 1977-08-20 | |||
| JP2000357583A | 2000-12-26 | |||
| JPH07288196A | 1995-10-31 | |||
| JPS6091A | 1985-01-05 | |||
| JP2004139863A | 2004-05-13 | |||
| JP2008066292A | 2008-03-21 | |||
| JP2008021494A | 2008-01-31 | |||
| JPS5220453A | 1977-02-16 | |||
| JPH10172750A | 1998-06-26 | |||
| JPS63174296A | 1988-07-18 | |||
| JPH07288433A | 1995-10-31 | |||
| JPS5299448A | 1977-08-20 | |||
| JP2000357583A | 2000-12-26 | |||
| JPH07288196A | 1995-10-31 | |||
| JPS6091A | 1985-01-05 | |||
| JP2004139863A | 2004-05-13 | |||
| JPS5696486A | 1981-08-04 |
Hiroki Naito
Daisuke Nagano
Next Patent: PLASMA DISPLAY PANEL AND METHOD FOR MANUFACTURING THE SAME