Title:
MIRROR FOR EUV AND EUV ALIGNER HAVING THE SAME
Document Type and Number:
Japanese Patent JP2009141178
Kind Code:
A
Abstract:
To provide a mirror for EUV capable of precisely managing a stress relaxing layer having a film period longer than that of a reflection layer.
The mirror for EUV has a substrate 11, a reflection layer 18 for EUV light, and the stress relaxing layer 17 formed between the reflection layer 18 and the substrate 11 and composed of a multilayered film having a prescribed film period. The mirror of EUV also has an evaluation region 14 of the stress relaxing layer that is formed at a region different from an effective region 13 where the reflection layer 18 and the stress relaxing layer 17 are formed, on the substrate 11 and is composed of a multilayered film having a film period different from that of the stress relaxing layer 17.
Inventors:
FURUTOKU MASAFUMI
MASAKI BUNTARO
MIYAKE AKIRA
MASAKI BUNTARO
MIYAKE AKIRA
Application Number:
JP2007316803A
Publication Date:
June 25, 2009
Filing Date:
December 07, 2007
Export Citation:
Assignee:
CANON KK
International Classes:
H01L21/027; G03F7/20; G21K1/06
Attorney, Agent or Firm:
Keizo Nishiyama
Yuichi Uchio
Yuichi Uchio