Title:
MIRROR AND MIRROR SUBSTRATE WITH HIGH ASPECT RATIO, AND METHOD AND MEANS FOR PRODUCING SUCH MIRROR SUBSTRATE
Document Type and Number:
Japanese Patent JP2020024416
Kind Code:
A
Abstract:
To provide a mirror substrate which has a high aspect ratio and small absolute thickness and also offers superior surface quality, dimensional precision and stability, and to provide a support body that can be used to produce the high aspect ratio mirror substrate and a mirror, and a method of manufacturing such mirror substrate and mirror.SOLUTION: A mirror substrate disclosed herein has a mean linear thermal expansion coefficient, a ratio of a lateral dimension to a maximum thickness, a weight per unit area, and a surface roughness, which are within specific conditional ranges.SELECTED DRAWING: None
Inventors:
SCHAFER MARTIN
MARCO WEISENBURGER
VOLKER SEIBERT
THOMAS WESTERHOFF
MARCO WEISENBURGER
VOLKER SEIBERT
THOMAS WESTERHOFF
Application Number:
JP2019146326A
Publication Date:
February 13, 2020
Filing Date:
August 08, 2019
Export Citation:
Assignee:
SCHOTT AG
International Classes:
G02B5/08; B32B18/00; C03C3/06; C03C10/04; C03C10/12; C03C19/00; G02B7/182; G02B7/192; G03F7/20
Domestic Patent References:
| JP2012181220A | 2012-09-20 | |||
| JPH0868897A | 1996-03-12 |
Attorney, Agent or Firm:
Einzel Felix-Reinhard
Morita Taku
Junichi Maekawa
Hiroyasu Ninomiya
Ueshima
Morita Taku
Junichi Maekawa
Hiroyasu Ninomiya
Ueshima