Title:
ミラー、特にマイクロリソグラフィ用のコレクタミラー
Document Type and Number:
Japanese Patent JP6650452
Kind Code:
B2
Abstract:
A collector mirror for an EUV microlithography system. The collector mirror includes an optical grating having an optically effective mirror surface, which reflects electromagnetic used rays in an EUV spectral range emanating from a first focal point and focuses them onto a second focal point. The first and second focal points lie on a side of the optical grating facing the mirror surface and define an optical axis. The optical grating is configured, in interaction with a stop arranged at the second focal point, to allow the used rays to pass through the stop and to block electromagnetic remaining rays in a remaining spectral range different than the EUV spectral range. The optical grating includes a blazed grating composed of a plurality of mirror facets, each having a facet surface. The facet surfaces form the mirror surface of the blazed grating.
Inventors:
Marx Bower
Application Number:
JP2017528558A
Publication Date:
February 19, 2020
Filing Date:
November 26, 2015
Export Citation:
Assignee:
Carl Zeiss SGM Gaehha
International Classes:
G03F7/20; G02B5/10; G02B5/18
Domestic Patent References:
| JP2012212904A | ||||
| JP2005302998A | ||||
| JP2013175724A | ||||
| JP2010004001A | ||||
| JP2005522026A |
Foreign References:
| WO2014170093A2 | ||||
| US20080285919 | ||||
| WO2010086324A1 | ||||
| DE102011084266A1 |
Attorney, Agent or Firm:
Kenji Sugimura
Mitsutsugu Sugimura
Miyata Kousuke
Mitsutsugu Sugimura
Miyata Kousuke