Title:
MIX-AND-MATCH EXPOSURE METHOD
Document Type and Number:
Japanese Patent JP3245556
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To improve an overlay accuracy at the time of performing exposure shots through stepper exposure, by performing correction of an overlay accuracy of the exposure shots at every stepper exposure shot contained in the same scan exposure area.
SOLUTION: When exposure shorts are performed through stepper exposure, correction of overlay errors of the exposure shots (correction of degree of orthogonality) is performed at every stepper exposure shot 1 contained in the same scan exposure area 2 (in the unit of two chips). Then the process again returns to a lithography process through a dry etching process, an ion implanting process, a film forming process, etc., and the lithography process uses a scan type aligner which uses a KrF excimer laser as a light source. When this aligner is used, two chips are contained in one exposure field. When these two chips are made coincident with the correction unit of the degree of orthogonality in the stepper exposure, an excellent overlaying state is obtained even from scan exposure.
Inventors:
Takeo Hashimoto
Application Number:
JP31693097A
Publication Date:
January 15, 2002
Filing Date:
November 18, 1997
Export Citation:
Assignee:
NEC
International Classes:
G03F7/20; H01L21/027; (IPC1-7): H01L21/027
Domestic Patent References:
| JP97919A |
Attorney, Agent or Firm:
Naoki Kyomoto (2 outside)
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