Title:
混合金属‐シリコン‐酸化物バリア
Document Type and Number:
Japanese Patent JP6437463
Kind Code:
B2
Abstract:
A method of forming a thin barrier film of a mixed metal-silicon-oxide is disclosed. For example, a method of forming an aluminum-silicon-oxide mixture having a refractive index of 1.8 or less comprises exposing a substrate to sequences of a non-hydroxylated silicon-containing precursor, activated oxygen species, and metal-containing precursor until a mixed metal-silicon-oxide film having a thickness of 500 Ångstroms or less is formed on the substrate.
Inventors:
Eric Earl Dicky
Brian Larson Danforth
Brian Larson Danforth
Application Number:
JP2015559305A
Publication Date:
December 12, 2018
Filing Date:
February 26, 2014
Export Citation:
Assignee:
LOTUS APPLIED TECHNOLOGY, LLC
International Classes:
C23C16/455; B32B9/00; C23C16/40; H01L51/50; H05B33/04; H05B33/10
Domestic Patent References:
| JP2012504304A | ||||
| JP2009158927A | ||||
| JP3164449A |
Foreign References:
| WO2012003198A2 | ||||
| WO2005097484A1 | ||||
| WO2012020771A1 | ||||
| US20060223337 |
Attorney, Agent or Firm:
Kenji Sugimura
Kenichiro Kataoka
Suzuki Asami
Kenichiro Kataoka
Suzuki Asami