Title:
MIXTURE CLEANING GAS COMPOSITION
Document Type and Number:
Japanese Patent JP2003218100
Kind Code:
A
Abstract:
To provide cleaning gas for removing unnecessary matters deposited on the inner wall, and the like, of a thin film forming system, and the jigs, components, piping, and the like, of the system.
The mixture cleaning gas composition contains at least one kind of gas selected from COF2, CO2, halogen gas, halogenated hydrogen, and carbonyl halide.
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Inventors:
MORI ISAMU
KONDO TAKESHI
OHASHI MITSUYA
KONDO TAKESHI
OHASHI MITSUYA
Application Number:
JP2002011825A
Publication Date:
July 31, 2003
Filing Date:
January 21, 2002
Export Citation:
Assignee:
CENTRAL GLASS CO LTD
International Classes:
C09K13/00; C23C14/00; C23C16/44; C23F1/12; C23F4/00; H01L21/302; H01L21/3065; H01L21/31; (IPC1-7): H01L21/31; C09K13/00; C23C14/00; C23C16/44; C23F1/12; C23F4/00; H01L21/3065
Attorney, Agent or Firm:
Yoshiyuki Nishi