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Title:
MoSi2-Si3N4 COMPOSITE COATING LAYER AND MANUFACTURING METHOD
Document Type and Number:
Japanese Patent JP3793157
Kind Code:
B2
Abstract:
PROBLEM TO BE SOLVED: To provide an MoSi2-Si3N4 composite coating layer which is formed on a substrate material composed of molybdenum, a molybdenum alloy, molybdenum- coated niobium or a molybdenum-coated niobium alloy and by which repeated-oxidation resistance and low temperature oxidation resistance can be improved and the high- temperature mechanical properties of a coating layer can be improved, and also to provide its manufacturing method. SOLUTION: The method for manufacturing the MoSi2-Si3N4 composite coating layer comprises (1) a process where nitrogen is vapor-deposited onto the surface of the substrate material to form an Mo2N diffusion layer and then silicon is vapor- deposited onto the surface of the Mo2N diffusion layer to form the MoSi2-Si3N4 composite coating layer; and (2) a process where silicon is vapor-deposited onto the surface of the substrate material by a chemical vapor deposition method (CVD) to form an MoSi2 diffusion layer, the MoSi2 diffusion layer is heated under a high-purity hydrogen or argon atmosphere to undergo phase transformation into an Mo5Si3 diffusion layer, nitrogen is vapor-deposited onto the surface of the Mo5Si3 diffusion layer by CVD to form an Mo2N-Si3N4 composite diffusion layer, and silicon is vapor-deposited onto the surface of the Mo2N-Si3N4 composite diffusion layer to form the MoSi2-Si3N4 composite coating layer.

Inventors:
Money
Kim Hoho
Tomonaga
Youn
Golden dragon
Lee Bell
Application Chur
Roh the Great Tiger
Application Number:
JP2003020558A
Publication Date:
July 05, 2006
Filing Date:
January 29, 2003
Export Citation:
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Assignee:
Korea Institute of Science and Technology
International Classes:
C23C8/34; C23C8/02; C23C10/02; C23C10/44; C23C12/00; C23C14/06; C23C16/42; (IPC1-7): C23C8/34; C23C10/44; C23C16/42
Domestic Patent References:
JP4834291B1
JP60228668A
JP61186470A
JP3100160A
JP4815778B1
JP61250171A
Attorney, Agent or Firm:
Hajime Tsukuni
Fumio Shinoda
Koshiro Tsukuda