Title:
修飾フリーアシッド型ヘテロポリ酸、修飾ヘテロポリ酸塩、およびフリーアシッド型ヘテロポリ酸系重合体
Document Type and Number:
Japanese Patent JP4999491
Kind Code:
B2
Inventors:
Kenji Nomiya
Go Hasegawa
Go Hasegawa
Application Number:
JP2007047272A
Publication Date:
August 15, 2012
Filing Date:
February 27, 2007
Export Citation:
Assignee:
Kimoto Co., Ltd.
International Classes:
C07F19/00; B01J31/06; B01J31/40; B01J38/00; C08F2/00; C07F9/02; C07F11/00; C09K3/16
Domestic Patent References:
| JP2007230857A | ||||
| JP2008006733A | ||||
| JP2003261493A | ||||
| JP9169694A | ||||
| JP2002205969A | ||||
| JP2003334451A | ||||
| JP2004250349A | ||||
| JP2000319211A |
Attorney, Agent or Firm:
Koji Matsuyama