PURPOSE: To provide a modifying device such that dust hardly adheres to an object to be processed and the temperature of the object can be rapidly raised by exposing the object to ultraviolet rays and a reactive oxidizing gas while the object is held at its circumferential part and subjected to radiation heating.
CONSTITUTION: While an object 1 is held at its circumferential part and subjected to radiation heating, the object 1 is exposed to ultraviolet rays and a reactive oxidizing gas to modify the surface of the object 1. The object 1, for example, is put on a rotatable stage 4, which holds the wafer at the circumferential part, between two plates 2 and 3. The plates 2 and 3 transmit both ultraviolet rays and radiations for heating. A low-pressure mercury discharge lamp 7 is provided on one side of the plate 2 oppositely to the object 2 while a tungsten halogen lamp 8 as a radiation source is provided on one side of the plate 3 oppositely to the object 2. The oxidizing gas is fed from a plurality of nozzles 9 put through the plate 2.
TSUNEKAWA SUKEYOSHI
INADA AKIISA
YAMAGUCHI SUMIO
KOIZUMI KOTARO
