Title:
型の製造方法および型を用いた反射防止膜の製造方法
Document Type and Number:
Japanese Patent JP4531131
Kind Code:
B1
Abstract:
A motheye mold fabrication method of the present invention includes the steps of: (a) preparing an Al base in which an Al content is less than 99.99 mass%; (b) partially anodizing the Al base to form a porous alumina layer which has a plurality of very small recessed portions; (c) after step (b), allowing the porous alumina layer to be in contact with an etchant which contains an anodic inhibitor, thereby enlarging the plurality of very small recessed portions of the porous alumina layer; and (d) after step (c), further anodizing the Al base to grow the plurality of very small recessed portions.
Inventors:
Ichiro Ihara
Application Number:
JP2010513515A
Publication Date:
August 25, 2010
Filing Date:
December 22, 2009
Export Citation:
Assignee:
Sharp Corporation
International Classes:
C25D11/04; B29C33/38; C22C21/00; C23F1/00; C25D11/12; C25D11/24; G02B1/10; G02B1/118
Domestic Patent References:
| JP2005156695A | 2005-06-16 | |||
| JP2007086283A | 2007-04-05 | |||
| JP2008209867A | 2008-09-11 |
Foreign References:
| WO2006059686A1 | 2006-06-08 |
Attorney, Agent or Firm:
Seiji Okuda
Osamu Kita
Ryoji Yamashita
Akiko Miyake
Kawaguchi Hisashi
Osamu Kita
Ryoji Yamashita
Akiko Miyake
Kawaguchi Hisashi