Title:
離型処理方法、型および反射防止膜の製造方法
Document Type and Number:
Japanese Patent JP6568563
Kind Code:
B2
Abstract:
The invention provide a new mold release treatment method, a mold subjected to a mold release treatment, and an antireflection film which improve sustainability of mold releasability of a mold havinga porous alumina layer on its surface. The method comprise a Step A of preparing a mold mold (100) having a porous alumina layer (14) on its surface, a precursor solution (21) containing a silicon oxide precursor and a solvent, and a mold release agent containing a fluorine silane coupling agent are prepared; a step B of applying a precursor solution to the surface; a step C of reducing at least asolvent contained in the precursor solution applied to the surface after step B; after step B, a step D of forming an insulating layer (22) containing silicon oxide and substantially free of carbon is formed by firing a silicon oxide precursor contained in a precursor solution applied to a surface; and a step E of applying a releasing agent on a surface after steps C and D.
Inventors:
Kenichiro Nakamatsu
Application Number:
JP2017188256A
Publication Date:
August 28, 2019
Filing Date:
September 28, 2017
Export Citation:
Assignee:
Sharp Corporation
International Classes:
B29C33/58; B29C33/62; B29C59/02; G02B1/118
Domestic Patent References:
| JP1157808A | ||||
| JP2014124873A | ||||
| JP2011213053A | ||||
| JP2011213005A | ||||
| JP2011020360A |
Foreign References:
| WO2012133390A1 | ||||
| WO2013146656A1 |
Attorney, Agent or Firm:
Seiji Okuda
Osamu Kita
Ryoji Yamashita
Akiko Miyake
Hidetaka Okabe
Yu Tanaka
Murase Nariyasu
Rinko Kita
Osamu Kita
Ryoji Yamashita
Akiko Miyake
Hidetaka Okabe
Yu Tanaka
Murase Nariyasu
Rinko Kita