Title:
成形され、低密度な集束イオンビーム
Document Type and Number:
Japanese Patent JP5259035
Kind Code:
B2
Abstract:
A method and apparatus for providing a shaped ion beam having low current density and sharp edges. The low current density and sharp edges eliminate the problem of overmilling, while permitting rapid ion beam processing. One method of producing the shaped beam is by using a two lens system, the first lens imaging the source onto the plane of the second lens and the second lens forming an image of the aperture onto the target plane. Another method is to greatly underfocus a chromatic aberration limited beam. Large beams having uniform current density and sharp edges can be produced. A knife edge beam, having a sharp edge can also be produced.
Inventors:
Jarratch, Robert El
Utrout, Mark W
Tesh, Paul Pea
Young, Richard Jay
Chandler, Clive Dee
Van der must, karl dee
Utrout, Mark W
Tesh, Paul Pea
Young, Richard Jay
Chandler, Clive Dee
Van der must, karl dee
Application Number:
JP2001553556A
Publication Date:
August 07, 2013
Filing Date:
January 19, 2001
Export Citation:
Assignee:
FEI COMPANY
International Classes:
C23C14/32; H01J37/317; G01Q70/14; H01J37/30; H01J37/305
Domestic Patent References:
| JP11077333A | ||||
| JP10162769A | ||||
| JP9199072A | ||||
| JP10144583A |
Foreign References:
| WO1999013500A1 |
Attorney, Agent or Firm:
Tadahiko Ito
Tadashige Ito
Shinsuke Onuki
Tadashige Ito
Shinsuke Onuki