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Patent Searching and Data


Title:
MONOMOLECULAR FILM FORMING METHOD
Document Type and Number:
Japanese Patent JP2006255811
Kind Code:
A
Abstract:

To provide a monomolecular film forming method for forming a homogeneous monomolecular film in a predetermined region on a substrate without the need for a complicated device and a great amount of waste liquid treatment and for forming a two-dimensional array structure consisting of a plurality of different monomolecular film regions on the same substrate without undergoing multiple processes.

First, a coupling agent 2 of alkoxysilane is applied to a predetermined region on the surface of the substrate subjected to hydrophilizing treatment, using a manipulator 3. Then, in the state of being held for a certain time in a non-oxygen atmosphere containing no oxygen under predetermined humid environment, the silane coupling agent 2 reacts with the surface of the substrate and the silane coupling agent 2 is fixed to the substrate 1. When different silane coupling agents 2a, 2b, 2c are applied to predetermined positions on the substrate, the two-dimensional array structure is manufactured in one process where nano materials different in type are fixed.


Inventors:
SHIRAHATA NAOTO
SAKKA YOSHIO
YONEZAWA TORU
HOZUMI ATSUSHI
Application Number:
JP2005073799A
Publication Date:
September 28, 2006
Filing Date:
March 15, 2005
Export Citation:
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Assignee:
NAT INST FOR MATERIALS SCIENCE
International Classes:
B82B3/00; H01L21/027; H01L29/06