To provide a moving apparatus that changes a relative position relationship between a wafer and a mask in proximity exposure and that is capable of preventing a contact accident between the wafer and mask.
The moving apparatus comprises: a mask holding mechanism 23 for holding a mask having a mask surface that is formed with a pattern to be transferred through the proximity exposure; a wafer holding mechanism 12 for holding a wafer having an exposure surface to be exposed via a mask: a moving mechanism 11 for moving at least one of the mask holding mechanism and wafer holding mechanism such that the relative position of the mask with respect to the wafer moves; a magnet whose relative position with respect to one of the mask and wafer is fixed; a magnetic sensor 17 whose relative position with respect to the other one of the mask and wafer is fixed; and a control mechanism 100 for determining whether a signal corresponding to an output of the magnetic sensor is inputted and the output is within an accepted range.
Mikio Kuruyama
Ukai Shinichi
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