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Title:
MUFFLE, FIRING FURNACE, MANUFACTURING METHOD OF MUFFLE
Document Type and Number:
Japanese Patent JP2016038191
Kind Code:
A
Abstract:
PROBLEM TO BE SOLVED: To provide a muffle in which silicon carbide and silicon dioxide are hard to occur inside the muffle when a compact containing silicon is fired.SOLUTION: A muffle is attached into a firing chamber of a firing furnace used for firing a compact containing silicon. The muffle comprises a muffle body comprising carbon, and a protective film comprising carbon formed on the inner wall of the muffle body. The porosity of the protective film is made lower than that of the muffle body.SELECTED DRAWING: Figure 1

Inventors:
IWAMOTO MASAHIRO
Application Number:
JP2014163762A
Publication Date:
March 22, 2016
Filing Date:
August 11, 2014
Export Citation:
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Assignee:
IBIDEN CO LTD
International Classes:
F27B5/10; C04B35/565; C04B35/64; F27D5/00
Domestic Patent References:
JPH08259209A1996-10-08
JPH1150101A1999-02-23
JPS63302291A1988-12-09
JP2000088474A2000-03-31
JP2007084395A2007-04-05
JPH0590298U1993-12-10
Attorney, Agent or Firm:
Atomi International Patent Office