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Title:
MULTI-BEAM EXPOSURE APPARATUS
Document Type and Number:
Japanese Patent JP2005203697
Kind Code:
A
Abstract:

To provide multi-beam exposure apparatus that can measure light intensity data such as light intensity distribution for adjusting shading or an exposure level in scanning exposure using a multi-beam emitted from a spatial light modulator.

An opening plate 78 disposed on an exposure surface intercepts light that is not an object of the measurement of light intensity data at a spatial light modulator, and allows an exposure beam 48 corresponding to a pixel as the object of the measurement to pass through the plate using an opening 80 pierced in the opening plate 78. The opening 80 in the opening plate 78 is moved by a feeding mechanism in a cross direction to a scanning exposure direction. For the exposure beam 48 that has passed through the opening 80, light intensity distribution is measured by a light receiving element 86.


Inventors:
FUKUDA TSUYOSHI
Application Number:
JP2004010730A
Publication Date:
July 28, 2005
Filing Date:
January 19, 2004
Export Citation:
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Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
B41J2/46; B41J2/465; G03F7/20; H01L21/027; (IPC1-7): H01L21/027; B41J2/46; G03F7/20
Domestic Patent References:
JP2003097920A2003-04-03
JP2001290096A2001-10-19
JP2003337426A2003-11-28
JPH10185684A1998-07-14
JPH01186352A1989-07-25
Attorney, Agent or Firm:
Atsushi Nakajima
Kato Kazunori
Katsuichi Nishimoto
Hiroshi Fukuda