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Title:
MULTI-BEAM EXPOSURE DEVICE
Document Type and Number:
Japanese Patent JP2006085071
Kind Code:
A
Abstract:

To provide a multi-beam exposure device for recording an expression using an FM screen by using an two-dimensional optical modulator, increasing the number of exposable dots at once in a direction orthogonal to the scanning direction, and using a beam spot that has become rectangular by beam splitting.

The multi-beam exposure device divides a plurality of exposure beam spots BS, projected to an exposure face so as to be arranged in parallel to the scanning direction from the two-dimensional optical modulator into a plurality of blocks G1, G2 and G3 in the scanning direction, is mutually shifted in the direction orthogonal to the scanning direction, and scans and exposes, in a state in which the exposure beam spot BS concerning at least one block G and the exposure beam spot BS concerning the other blocks G are shifted. Furthermore, the multi-beam exposure device scans and exposes an edge part by a steep beam spot BS by transmitting a plurality of optical beams in an optical element of a uniaxial crystal and distributing each optical beam with equal intensity in the form of a substantially rectangle at a focused point, as a normal beam and as an abnormal beam separated in a sub-scanning direction so as to partly overlap.


Inventors:
MIYAGAWA ICHIRO
Application Number:
JP2004272389A
Publication Date:
March 30, 2006
Filing Date:
September 17, 2004
Export Citation:
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Assignee:
FUJI PHOTO FILM CO LTD
International Classes:
G03F7/20
Attorney, Agent or Firm:
Atsushi Nakajima
Kato Kazunori
Katsuichi Nishimoto
Hiroshi Fukuda