Title:
Multi-charged particle beam drawing apparatus
Document Type and Number:
Japanese Patent JP6057700
Kind Code:
B2
Abstract:
A multi charged particle beam writing apparatus includes a stage to mount a target object thereon and to be movable, an emission unit to emit a charged particle beam, an aperture member, in which a plurality of openings are formed, to produce multiple beams by letting a region including the whole of a plurality of openings be irradiated with the charged particle beam and letting portions of the charged particle beam respectively pass through a corresponding opening of a plurality of openings, a reduction optical system to reduce the multiple beams, and a doublet lens, arranged at the subsequent stage of the reduction optical system, in which a magnification is 1 and directions of magnetic fluxes are opposite.
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Inventors:
Takaya Toya
Munehiro Ogasawara
Munehiro Ogasawara
Application Number:
JP2012282716A
Publication Date:
January 11, 2017
Filing Date:
December 26, 2012
Export Citation:
Assignee:
New Flare Technology Co., Ltd.
International Classes:
H01L21/027; G03F7/20
Domestic Patent References:
| JP2003332207A | ||||
| JP2246316A | ||||
| JP2012174750A | ||||
| JP2002329471A | ||||
| JP2005244105A | ||||
| JP2002353128A | ||||
| JP2008210897A |
Attorney, Agent or Firm:
Tetsuma Ikegami
Akira Sudo
Mitsuyuki Matsuyama
Akira Sudo
Mitsuyuki Matsuyama