Title:
マルチ荷電粒子ビーム描画装置及びマルチ荷電粒子ビーム描画方法
Document Type and Number:
Japanese Patent JP6863208
Kind Code:
B2
Abstract:
In one embodiment, a multi charged particle beam writing apparatus includes a stage position detector detecting a position of the stage which holds a substrate to be written, a mark disposed on the stage, a beam position detector detecting a beam position of each beam by allowing the multiple beams to pass over the mark, a beam shape detector detecting a beam shape of the multiple beams at predetermined time intervals based on the detected beam position and the detected position of the stage, the multiple beams being used to irradiate the substrate, and a writing data processor calculating an amount of irradiation correction of each beam for correcting the beam shape based on the detected beam shape.
Inventors:
Ryoichi Kage
Osamu Iizuka
Osamu Iizuka
Application Number:
JP2017190882A
Publication Date:
April 21, 2021
Filing Date:
September 29, 2017
Export Citation:
Assignee:
New Flare Technology Co., Ltd.
International Classes:
H01L21/027; G03F7/20
Domestic Patent References:
| JP2016063149A | ||||
| JP2015179735A | ||||
| JP2016225357A | ||||
| JP2017107959A | ||||
| JP2008041890A | ||||
| JP2002175967A | ||||
| JP2014120495A | ||||
| JP2016219577A | ||||
| JP2011171510A | ||||
| JP2008085120A | ||||
| JP2016207815A |
Attorney, Agent or Firm:
Tsuyoshi Shigeno
Takayuki Shigeno
Takayuki Shigeno