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Title:
誘導結合型プラズマ発生システム用の複数コイル・アンテナ
Document Type and Number:
Japanese Patent JP5165821
Kind Code:
B2
Abstract:
A radio frequency plasma multiple-coil antenna allows for controllable, uniform inductive coupling within a plasma reactor. According to exemplary embodiments, multiple coils are positioned on a dielectric window of a plasma chamber, and are powered by a single radio frequency generator and tuned by a single matching network. Each coil is either planar or a combination of a planar coil and a vertically stacked helical coil. The input end of each coil is connected to an input tuning capacitor and the output end is terminated to the ground through an output tuning capacitor. The location of the maximum inductive coupling of the radio frequency to the plasma is mainly determined by the output capacitor, while the input capacitor is mainly used to adjust current magnitude into each coil. By adjusting the current magnitude and the location of the maximum inductive coupling within each coil, the plasma density in different radial and azimuthal regions can be varied and controlled, and therefore, radially and azimuthally uniform plasma can be achieved.

Inventors:
Chen, Gian, Jay.
Wiltrop, Robert, Gee.
Wicker, Thomas, Yi.
Application Number:
JP2000557486A
Publication Date:
March 21, 2013
Filing Date:
June 18, 1999
Export Citation:
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Assignee:
LAM RESEARCH CORPORATION
International Classes:
H01J37/32; H01L21/205; H05H1/46; H01L21/302; H01L21/3065
Domestic Patent References:
JP6267903A
JP10125663A
JP10125497A
JP878191A
JP850998A
JP10189296A
JP7296992A
Attorney, Agent or Firm:
Yasunori Otsuka
Shiro Takayanagi
Yasuhiro Otsuka
Shuji Kimura
Osamu Shimoyama
Nagakawa Yukimitsu